| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5367566 | Applied Surface Science | 2009 | 5 Pages |
Abstract
Potential of O2 remote plasmas for improving structural, morphological and optical properties of various multifunctional oxides thin films both during plasma assisted growth as well as by post-growth treatments is discussed. In particular, an O2 remote plasma metalorganic chemical vapor deposition (RP-MOCVD) route is presented for tailoring the structural, morphological and optical properties of Er2O3 and ZnO films. Furthermore, post-growth room-temperature remote O2 plasma treatments of indium-tin-oxides (ITO) films are demonstrated to be effective in improving morphology of ITO films.
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Authors
Maria M. Giangregorio, Maria Losurdo, Pio Capezzuto, Giovanni Bruno,