Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5367921 | Applied Surface Science | 2008 | 4 Pages |
Abstract
c-Axis oriented GaN nanocrystalline thin films were fabricated by nitridation of three different thin films of α-GaO(OH), α-Ga2O3 or β-Ga2O3 obtained by sol-gel technique on amorphous quartz glass substrates. All these GaN thin films showed near band edge emission at 390 nm and yellow luminescence at 570 nm. The crystalline nature and c-axis orientation as well as luminescence properties of the GaN thin films increased by several times by using a buffer layer of GaN on the substrate.
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Godhuli Sinha, Kalyan Adhikary, Subhadra Chaudhuri,