| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5367960 | Applied Surface Science | 2011 | 7 Pages |
Abstract
ⶠWe studied α-C thin films deposited by End-Hall (EH) ion beam at 24â¼48 eV. ⶠThe films are smooth and uniform on a large scale and intrinsically particulate-free. ⶠThe films have reasonably high hardness and Young's modulus. ⶠThe hardness and Young's modulus increase with the increase of ion energy. ⶠThe films may be used as protective coatings in magnetic disk storage technology.
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Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Y. Tang, Y.S. Li, Q. Yang, A. Hirose,