| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5367967 | Applied Surface Science | 2011 | 5 Pages |
Abstract
ⶠThe effect of precursors of CH4 and C2H2 + H2 on the structure of a-C:H films is investigated. ⶠThe a-C:H films from CH4 precursor is DLCH, while for C2H2 + H2 precursors is PLCH. ⶠThese two types a-C:H films show also opposite evolution trends with bias voltage increasing.
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Guangwei Guo, Guangze Tang, Yajun Wang, Xinxin Ma, Mingren Sun, Liqin Wang, Ken Yukimura,