Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5368059 | Applied Surface Science | 2011 | 4 Pages |
The effect of multi-step deposition process on the crystalline quality and surface smoothness of ZnO film was investigated. ZnO films were composed of multi-layers, in which each layer was deposited at different temperatures. The maximum intensity and the smallest FWHM of (0Â 0Â 2) diffraction peak in XRD spectrum were observed for the multi-layered ZnO film of which each layer was deposited at progressively higher temperatures. In addition, the smoothest film surface was also observed for the ZnO film deposited through multi-step process in which deposition temperatures gradually increase. On the other hand, the large difference between the deposition temperatures in multi-step process did not result in the significant improvement of the crystalline quality of ZnO film. The ZnO film prepared by using multi-step process had high transmittance over 70% in visible region and the optical band gap of 3.22Â eV.
Research highlightsâ¶ The crystalline quality of ZnO film was improved by multi-step deposition process. â¶ The deposition procedure had an effect on the crystalline quality of ZnO film. â¶ The interval of deposition temperature affected the crystallinity of ZnO film. â¶ The multi-step process is effective for improving the surface roughness of ZnO film.