| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5368337 | Applied Surface Science | 2007 | 6 Pages |
Abstract
It is well known that Taiwan's IC industry is in the very leading front of the world, and production of 65Â nm devices was launched in 2006. Within a few years, the need of high-k dielectrics and metal gates is eminent and truly indispensable. Professor H.L. Hwang (the author) organized 12 professors and 50 graduate students of National Tsing Hua University and Chiao Tung University, and executed this particular project, which is sponsored by the Ministry of Economic Affairs of Republic of China, and is aimed at treating efficiently this problem and transferred the critical technologies to industry in a time frame of 3 years.
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Huey-Liang Hwang, Yan-Kai Chiou, Che-Hao Chang, Chen-Chan Wang, Kun-Yu Lee, Tai-Bor Wu, Raynien Kwo, Minghwei Hong, Kuei-Shu Chang-Liao, Chun-Yuan Lu, Chun-Chang Lu, Fu-Chien Chiu, Chun-Heng Chen, Joseph Ya-Min Lee, Albert Chin,