Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5368424 | Applied Surface Science | 2007 | 6 Pages |
V2O5 thin films were prepared under various conditions by using reactive RF sputtering technique. The microstructure and electrical properties of the films are have been investigated. X-ray diffraction data revealed the films deposited at low O2/Ar ratio are amorphous. The orthorhombic structure of film improved after post annealing at 873 K. The microstructure parameters (crystallite/domain size and macrostrain) have been evaluated by using a single order Voigt profile method. Using the two-point probe technique, the dark conductivity as a function of the condition parameters such as film thickness, oxygen content and temperature are discussed. It was also found that, the behaviour of Ïd versus d was found to fit properly with the Fuchs-Sondheimer relation with the parameters: Ïo = 2.14 Ã 107 Ω cm and âo = 112 ± 2 nm. At high temperature, the electrical conductivity is dominated by grain boundaries, the values of activation energy and potential barrier height were 0.90 ± 0.02 eV and 0.92 ± 0.02 V, respectively.