Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5368499 | Applied Surface Science | 2010 | 7 Pages |
Abstract
Tetrakis(ethylmethylamido)hafnium and water are commonly used precursors for atomic layer deposition of HfO2. Using reflection absorption infrared spectroscopy with a buried-metal-layer substrate, we probe surface species present during typical deposition conditions. We observe evidence for thermal decomposition of alkylamido ligands at 320 °C. Additionally, we find that complete saturation of the SiO2 substrate occurs in the first cycle at â100 °C whereas incomplete coverage is apparent even after many cycles at higher temperatures. The use of this technique as an in situ diagnostic useful for process optimization is demonstrated.
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Authors
Brent A. Sperling, William A. Kimes, James E. Maslar,