Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5368683 | Applied Surface Science | 2006 | 4 Pages |
Abstract
Surfaces of two γ-TiAl alloys, Ti-47 at% Al-2at% Nb-2 at% Cr (MJ12) and Ti-47 at% Al-2 at% Nb-2 at% Mn + 0.8 at% TiB2 (MJ47), have been modified by acetylene plasma deposition at bias voltages of â4, â5 and â6 kV for 3.6 Ã 103 s (1 h) and 1.44 Ã 104 s (4 h). Knoop hardness (HK) of the alloys is increased with the increase of bias voltage and prolonged time for the deposition. HK of MJ12 and MJ47 deposited at â6 kV for 1.44 Ã 104 s is, respectively, 3.36 and 3.32 times as hard as the untreated alloys. SEM and AFM analyses show that the deposited alloys compose of a number of nano-dots which reflect their surface properties. The phases analyzed by XRD are in accord with the elements analyzed by EDX.
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Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Suparut Narksitipan, Titipun Thongtem, Michael McNallan, Somchai Thongtem,