| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5369251 | Applied Surface Science | 2006 | 6 Pages |
Abstract
Thin films of zinc oxide have been deposited by reactive pulsed laser ablation of Zn and ZnO targets in presence of a radio frequency (RF) generated oxygen plasma. The gaseous species have been deposited at several substrate temperatures, using the on-axis configuration, on Si (1Â 0Â 0). Thin films have been characterized by scanning electron microscopy, atomic force microscopy, X-ray diffraction, X-ray photoelectron spectroscopy and infrared spectroscopy. A comparison among conventional PLD and reactive RF plasma-assisted PLD has been performed.
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Authors
P. Bilkova, J. Zemek, B. Mitu, V. Marotta, S. Orlando,