Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5369813 | Applied Surface Science | 2007 | 7 Pages |
The study was performed to examine the correlation between the initial roughness and surface fluorination of paper under RF-CF4 plasma environment.Based on the experimental observations, a correlation was observed between surface fluorination and plasma parameters, e.g. RF-power, treatment time and gas pressure. The level of fluorination with RF-CF4 plasma treatment was found to be extensive in both side of paper. Even very short treatment time, as low as 1Â min at 300Â W power, provides effective implantation of fluorine (38.7%) on surfaces. It was observed that, CF4 plasma treatment had a significant effect on the molecular fragmentation on both side of paper. However, the felt side have a much stronger effect on plasma-induced dissociation and fluorination than in the wire side of paper.