Compositional contrast in AlxGa1−xN/GaN heterostructures using scanning spreading resistance microscopy

Scanning spreading resistance microscopy has found extensive use as a dopant-profiling technique for silicon-based devices, and to a lesser extent for some III-V materials. Here we demonstrate its efficacy for wide bandgap nitrides and, in particular, show that it may be used to differentiate between layers of different Al-content in an AlxGa1−xN/GaN heterostructure. A monotonic increase in resistance signal with increasing Al-content is demonstrated, under optimal imaging conditions. The variation in measured resistance with applied bias is shown to be dependent on the aluminium content, and this is discussed, along with other issues, in the context of potential quantification of unknown samples. The procedure for forming an optimal image is different from that for silicon, in terms of contact forces and applied biases.