| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5369892 | Applied Surface Science | 2007 | 4 Pages |
Abstract
It is reported for the first time that the periodical ripple surface feature at micrometer-scale was observed on hydrogenated amorphous carbon nitride films deposited by pulse plasma chemical vapor deposition (CVD) technique. Nitrogen incorporation to hydrogenated amorphous carbon films and the different growing environments of pulse dc plasma discharge perhaps played crucial role in the surface morphology transformation of hydrogenated amorphous carbon nitride films.
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Chengbing Wang, Shengrong Yang, Junyan Zhang,