| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5369973 | Applied Surface Science | 2006 | 6 Pages |
Abstract
Chemical vapor deposition (CVD) method was used in titania surface modification. Titania layers were obtained in sol-gel process and prepared as thin films on silicon wafers in dip-coating method. In order to define the influence of modification on titania surface properties (e.g., friction), various types of fluoroalkylsilanes were used. The effectiveness of the modification was monitored by FT-IR spectroscopy. The topography and frictional measurements were investigated with the use of atomic force microscopy (AFM).
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Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Ireneusz PiwoÅski, Aneta Ilik,