Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5370118 | Applied Surface Science | 2006 | 6 Pages |
Abstract
We have studied the formation of nanostructures on Si(100) surfaces after 1.5âMeV Sb implantation. Scanning Probe Microscopy has been utilized to investigate the ion implanted surfaces. We observe the formation of nanostructures after a fluence of 1Ã1013âions/cm2. These surface structures are elliptical in shape with an eccentricity of 0.86 and their major and minor axes having dimensions of about 11.6ânm and 23.0ânm, respectively. The area of the nanostructure is 210ânm2at this fluence. Although the nanostructures remain of elliptical shape, their area increase with increasing fluence. However, after a fluence of 5Ã1014âions/cm2 a transition in shape of nanostructures is observed. Nanostructures become approximately circular with an eccentricity of 0.19 and a diameter of about 30.1ânm. At this fluence we also observe a large increase in the area of the nanostructures to 726ânm2. Surface morphology and surface roughness of the ion implanted surfaces has also been discussed.
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Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Soma Dey, Dipak Paramanik, V. Ganesan, Shikha Varma,