Article ID Journal Published Year Pages File Type
5370246 Applied Surface Science 2006 5 Pages PDF
Abstract

A new technique called “infrared laser-assisted nanoimprint lithography” was utilised to soften the thermoplastic polymer material mR-I 8020 during nanoimprint lithography. A laser setup and a sample holder with pressure and temperature control were designed for the imprint experiments. The polymer was spin coated onto crystalline Si <1 1 1> substrates. A prepatterned Si <1 1 1> substrate, which is transparent for the CO2 laser irradiation, was used as an imprint stamp as well. It was shown, that the thermoplastic resist mR-I 8020 could be successfully imprinted using the infrared CW CO2 laser irradiation (λ = 10.6 μm). The etching rate of the CO2 laser beam irradiated mR-I 8020 resist film under O2 RF (13.56 MHz) plasma treatment and during O2 reactive ion beam etching was investigated as well.

Related Topics
Physical Sciences and Engineering Chemistry Physical and Theoretical Chemistry
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