Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5370350 | Applied Surface Science | 2006 | 5 Pages |
TiO2 thin films were deposited on the glass substrates by dc reactive magnetron sputtering technique at different sputtering pressures (2Â ÃÂ 10â3 to 2Â ÃÂ 10â2Â mbar). The films prepared at low pressures have an anatase phase, and the films prepared at high pressures have an amorphous phase. The optical properties were studied by measuring the transmittance and the ellipsometric spectra. The optical constants of the films in the visible range were obtained by fitting the transmittance combined with the ellipsometry measurements using the classical model with one oscillator. The refractive index of the films decreases from 2.5 until 2.1 as the sputtering pressure increases from 2Â ÃÂ 10â3 to 2Â ÃÂ 10â2Â mbar. The films prepared at the pressure higher than 6Â ÃÂ 10â3Â mbar show a volume inhomogeneity. This volume inhomogeneity has been calculated by fitting the transmittance and the ellipsometric spectra. The volume inhomogeneity of the film prepared at the highest sputtering pressure is about 10%. Although the films prepared at high pressures show a large volume inhomogeneity, they have low extinction coefficients. It is suggested that the anatase phase results in more light scattering than amorphous phase does, and then a high extinction coefficient.