Article ID Journal Published Year Pages File Type
5370460 Applied Surface Science 2005 5 Pages PDF
Abstract

The surfaces of nanostructured, porous SiOx/Si (air-oxidized Si) and SiOx thin films, deposited by excimer laser ablation in He and He + O2 gas ambients, respectively, have been modified by the deposition of a monofunctional organosilane. They were characterized using photoacoustic Fourier-transform infrared (FTIR) X-ray photoelectron (XPS) spectroscopies, and field-emission scanning electron microscopy (FESEM). Photoacoustic FTIR analysis indicates that the organosilane has hydrolyzed to form a silanol, which has chemically reacted with SiOx through its surface silanol (SiOH) group, to form siloxane (SiOSi) structures. An enhanced IR spectral signal is found, due to the expansion and contraction of both the pores of the solid and the gas within them.

Related Topics
Physical Sciences and Engineering Chemistry Physical and Theoretical Chemistry
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