| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5370461 | Applied Surface Science | 2005 | 4 Pages |
Abstract
A chemically abrupt Fe/Ce oxide interface can be formed by initial oxidation of an Fe film followed by deposition of Ce metal. Once a Ce oxide layer is formed on top of Fe, it acts a passivation barrier for oxygen diffusion. Further deposition of Ce metal followed by its oxidation preserve the abrupt interface between Ce oxide and Fe films. The Fe and Ce oxidation states have been monitored at each stage using X-ray photoelectron spectroscopy.
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
H.G. Lee, D. Lee, S. Kim, S.G. Kim, Chanyong Hwang,