| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5382149 | Chemical Physics Letters | 2013 | 6 Pages |
Abstract
⺠Cathodic oxidation nanolithography was demonstrated on the low-energy H+ ion beam irradiated silicon substrate. ⺠Giant oxide features with heights over 100 nm were fabricated by cathodic oxidation. ⺠The growth rate of the oxide features significantly increased on the H+ ion-irradiated substrate.
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Authors
H. Kim, S.-K. Kim, M.-K. Lee, S. Yun, Y. Song, K.-R. Kim, H. Shin, H. Lee,