| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5383865 | Chemical Physics Letters | 2011 | 5 Pages |
Abstract
⺠The electronic structure of HfF5- and WF5- is computed using ab initio methods. ⺠Hafnium fluorides are much more stable than the corresponding tungsten fluorides. ⺠The detachment energy is 8.8 eV for HfF5- and is only 3.9 eV for WF5-. ⺠It is possible to photodetach WF5- while leaving HfF5- unaffected. ⺠Photodetachment can be used to suppress interfering 182W in the detection of 182Hf.
Related Topics
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Authors
Hongshan Chen, Pontus Andersson, Anton O. Lindahl, Dag Hanstorp,