| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5384701 | Chemical Physics Letters | 2011 | 7 Pages |
Abstract
⺠XPS data show the average formal oxidation state of Si in fumed silica is +1. ⺠Less hydrophilic character for fumed silica than SiOx with +3 or +4 oxidation states. ⺠H2O on fumed silica surface facilitates conversion of Si(III) to Si(IV).
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Tsang-Hsiu Wang, James L. Gole, Mark G. White, Clifton Watkins, Shane C. Street, Zongtang Fang, David A. Dixon,