| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5385843 | Chemical Physics Letters | 2010 | 4 Pages |
The surface configuration evolvement of silicon with the increasing pulse number irradiated by femtosecond laser has been studied. The ripples and nanoparticles are formed in the irradiated region. The period of the ripples decreases with the increasing pulse number, while the diameter of the visible structured region increases with the increasing pulse number. The interference of laser with surface plasmons is proposed to explain the formation of the ripple. The decreasing of the spatial period for surface ripples is due to the decrease of the surface plasmon wavelength with the decreasing electron number density in the plasma.
Graphical abstractThe ripples and nanoparticles are formed on silicon irradiated by femtosecond laser. The period of the ripples decreases with the increasing pulse number, while the diameter of the visible structured region increases with the increasing pulse number. The interference of laser with surface plasmons is proposed to explain the formation of the ripple. The decreasing of the spatial period for surface ripples is due to the decrease of the surface plasmon wavelength with the decreasing electron number density in the plasma.Download high-res image (68KB)Download full-size imageResearch highlights⺠The ripples and nanoparticles are formed on silicon irradiated by femtosecond laser. ⺠The interference of laser with surface plasmons is the possible mechanism to form the ripple. ⺠The decreasing electron number density result to the decreasing of the ripples' period.
