| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5386576 | Chemical Physics Letters | 2010 | 4 Pages |
Abstract
High-quality ITO thin films at low temperature by tuning the oxygen flow rate using the nano-cluster deposition (NCD) technique studied.
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
S.V.N. Pammi, Anupama Chanda, Nak-Jin Seong, Soon-Gil Yoon,