| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5389561 | Chemical Physics Letters | 2006 | 5 Pages |
Abstract
Analytical threshold conditions for pattern-forming instabilities in networks of photochemically coupled reactors are derived, and the effect of the network topology on patterns is investigated.
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Werner Horsthemke, Chase E. Zachary, Peter K. Moore,