| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5389750 | Chemical Physics Letters | 2006 | 6 Pages |
Abstract
Extremely smooth, thin, and continuous ultrananocrystalline diamond films were synthesized by microwave plasma chemical vapor deposition using a 10Â nm tungsten (W) interlayer between the silicon substrate and the diamond film. The W interlayer significantly increased the initial diamond nucleation density, thereby lowering the surface roughness and eliminating interfacial voids.
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Physical and Theoretical Chemistry
Authors
Nevin N. Naguib, Jeffrey W. Elam, James Birrell, Jian Wang, David S. Grierson, Bernd Kabius, Jon M. Hiller, Anirudha V. Sumant, Robert W. Carpick, Orlando Auciello, John A. Carlisle,