| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5389867 | Chemical Physics Letters | 2006 | 4 Pages |
Abstract
Surface reactivity of CF2 was measured during hot filament chemical vapor deposition of fluorocarbon (FC) films using our imaging of radicals interacting with surfaces technique. CF2 exhibits low surface reactivity during deposition of CF2-rich films. Results are compared to measurements made during plasma-enhanced CVD of FC films.
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Dongping Liu, Ina T. Martin, Ellen R. Fisher,