The initial mechanisms of Al2O3 atomic layer deposition on OH/Si(1 0 0)-2 × 1 surface by tri-methylaluminum and water

The additional surface -OH group of OH/Si(1 0 0) significantly increases the thermodynamic stabilities of initial complex and subsequent products, and it reduces the reaction barriers of the initial deposition of TMA. It also allows the ring closing reaction essentially saturating surface bonding sites in between surface and Al2O3 junction region.