| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5390182 | Chemical Physics Letters | 2006 | 5 Pages |
Abstract
Molybdenum oxide (MoO3) thin films were prepared by pulsed-laser assisted deposition (PLD) over a wide range of growth temperature, 30-500 °C. The chemical composition, crystal structure, and electrochemical properties of PLD MoO3 thin films were investigated as a function of growth temperature. The results obtained are presented and discussed.
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
C.V. Ramana, C.M. Julien,