Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5395565 | Journal of Electron Spectroscopy and Related Phenomena | 2016 | 10 Pages |
Abstract
The nanoscale chemical characterization of III-V heterostructures is performed using Auger depth profiling below decananometric spatial resolution. This technique is successfully applied to quantify the elemental composition of planar and patterned III-V heterostructures containing InGaAs quantum wells. Reliable indium quantification is achieved on planar structures for thicknesses down to 9ânm. Quantitative 3D compositional depth profiles are obtained on patterned structures, for trench widths down to 200ânm. The elemental distributions obtained in averaged and pointed mode are compared. For this last case, we show that Zalar rotation during sputtering is crucial for a reliable indium quantification. Results are confirmed by comparisons with secondary ion mass spectrometry, photoluminescence spectroscopy, transmission electron microscopy and electron dispersive X-ray spectroscopy. The Auger intrinsic spatial resolution is quantitatively measured using an original methodology based on the comparison with high angle annular dark field scanning transmission electron microscopy measurements at the nanometric scale.
Keywords
FIB81.07.St68.65.FgSTEM-HAADFSTEM-EDXMOCVD81.05.EaHAADF-STEMRBS68.37.XyAesRutherford Backscattering SpectrometryFocused ion beamMetal organic chemical vapor depositionSIMSAuger electron spectroscopysecondary ion mass spectrometryRelative sensitivity factorsPhotoluminescenceMOSFETsAuger depth profilingQuantum well
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
W. Hourani, V. Gorbenko, J.-P. Barnes, C. Guedj, R. Cipro, J. Moeyaert, S. David, F. Bassani, T. Baron, E. Martinez,