| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5395833 | Journal of Electron Spectroscopy and Related Phenomena | 2014 | 7 Pages |
Abstract
- Density of SrTiO3 films depends on underlayer material in SrTiO3/B/Si-ALD systems.
- Interface is very abrupt for the sample prepared on Si3N4 underlayer.
- HfO2 underlayer leads to formation of wide interface.
- SXRR emerges as a tool of atomic analysis at sub-nanometer scale.
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
E.O. Filatova, I.V. Kozhevnikov, A.A. Sokolov, A.S. Konashuk, F. Schaefers, M. Popovici, V.V. Afanas'ev,