| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5396439 | Journal of Electron Spectroscopy and Related Phenomena | 2012 | 4 Pages |
Abstract
⺠A novel method to prepare the black silicon by plasma immersion ion implantation has been put forward. ⺠The microstructure of the black silicon with low reflectance can be controlled by varying the parameters. ⺠The formation mechanism of the black silicon has been investigated by XPS.
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Yang Xia, Bangwu Liu, Sihua Zhong, Chaobo Li,