Beam-induced effects in soft X-ray photoelectron emission microscopy experiments

The beam-induced effects, a consequence of the high photon flux density used in soft X-ray photoelectron emission microscopes in operation at the 3rd generation synchrotron sources, are discussed and illustrated using some representative results obtained with the microscopes at the laboratory Elettra. The focus is on the photon-induced charge potential and chemical degradation, which might be a severe problem for photon-sensible specimens. The possible steps to avoid, reduce or even make use of the beam-induced effects are outlined.