| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5397010 | Journal of Electron Spectroscopy and Related Phenomena | 2006 | 5 Pages |
Abstract
The Laplace transform of the Wang, Kwei and Frisch equation for the concentration depth profile of a diffusant in a glassy polymer has been derived and applied to the interpretation of ARXPS data obtained on a polystyrene film exposed to a helium/oxygen plasma. It was found that the best fit to the data was given by a rectangular oxygen profile that would be characteristic of Case II diffusion. The reliability of this finding is discussed in terms of the uniqueness of the fitted profile.
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Authors
R.W. Paynter, M. Ménard,