Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5397240 | Journal of Electron Spectroscopy and Related Phenomena | 2006 | 5 Pages |
Abstract
The influence of deposited potassium on the oxidation and NO reactivity of a Co(0 0 0 1) surface was studied using X-ray photoelectron spectroscopy. The formation of surface CoO was observed when the clean Co(0 0 0 1) surface was exposed to O2 at 500 K. In contrast, the Co atoms on the K-deposited Co(0 0 0 1) surface remained at a lower oxidation state, CoOx (0 < x < 1). No adsorption or dissociation of NO occurred on the CoO/Co(0 0 0 1) surface at 320 K, whereas a NO2â species formed on the oxidized K/Co(0 0 0 1) surface. This species is considered to be an intermediate in NO decomposition. It was concluded that the role of potassium was (i) to form the NO2â intermediate, and (ii) to keep the Co surface partially oxidized (CoOx) as the active site for the dissociation of the NO2â species.
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Physical Sciences and Engineering
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Authors
I. Nakamura, M. Haneda, H. Hamada, T. Fujitani,