Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5403337 | Journal of Luminescence | 2007 | 6 Pages |
Abstract
The zincgallate (ZnGa2O4) phosphor thin film was grown using RF magnetron sputtering system at various process parameters. A ZnGa2O4 phosphor thin film was deposited on Si(1Â 0Â 0) substrate and annealed by a rapid thermal processor (RTP). The X-ray diffractometer (XRD) patterns indicate that the Mn-doped ZnGa2O4 phosphor thin film shows a (3Â 1Â 1) main peak and a spinel phase. A ZnGa2O4 phosphor thin film has better crystallization due to increased substrate, annealing temperature and deposition time. Also the ZnGa2O4:Mn phosphor thin film shows green emission (510Â nm, 4T1â6A1), and the ZnGa2O4:Cr phosphor thin film shows red emission (705Â nm, 4A2â4T2).
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Hyung-Wook Choi, Beom-Joo Hong, Seung-Kyu Lee, Kyung-Hwan Kim, Yong-Seo Park,