Article ID Journal Published Year Pages File Type
5419126 Journal of Molecular Structure: THEOCHEM 2006 10 Pages PDF
Abstract
The reaction mechanisms of HNXH2 (X = C, Si) + NO were studied at the QCISD(T)/6-311++G(d,p)//B3LYP/6-311++G(d,p) level. The result indicated that the most favorable pathway of HNCH2 + NO would lead to the formation of CH2N2 + OH with the calculated barrier of 44.41 kcal/mol, while in the reaction of HNSiH2 + NO the most preferable pathway shifted to the production of H2SiOH + N2, a direct reduction of NO into a stable and nontoxic nitrogen molecule. The barrier of rate-determining step was calculated to be 18.90 kcal/mol, and it could be further decreased to 14.42 kcal/mol in the N-methyl substituted silanimine (CH3NSiH2). It could be advantageous if it would act as a reactant in converting the reactive and toxic NO into a harmless N2 gas in several NO-producing combustion systems. The possible explanation to the differences between imine and silanimine toward the reaction with NO was provided.
Related Topics
Physical Sciences and Engineering Chemistry Physical and Theoretical Chemistry
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