| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5420034 | Progress in Surface Science | 2011 | 40 Pages |
Abstract
⺠Multilayer optimization to the highest achieved reflectance: 70.3% record value. ⺠Growth control of thin layers down to 0.1 nm rms roughness. ⺠Diffusion barriers to enhance reflectance and improve thermal stability. ⺠Capping layers to protect against surface oxidation by photon exposure and cleaning. ⺠Multilayer optics for real lithographic systems: 69.6% on real optics.
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Authors
E. Louis, A.E. Yakshin, T. Tsarfati, F. Bijkerk,