| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5422308 | Surface Science | 2013 | 8 Pages |
Abstract
We present a study of the growth and reactivity of ultra-thin films of TiO2 grown on W(100). Three approaches to film growth are investigated, each resulting in films that show order in low-energy diffraction (LEED) and a low level of non-stoichiometry in X-ray photoelectron spectroscopy (XPS). H2O is used as a probe of the reactivity of the films, with changes in the Ti 2p and O 1s core levels being monitored by XPS. Evidence for the dissociation of H2O on the TiO2(110) ultra-thin film surface is adduced. These results are discussed with reference to related studies on native TiO2(110).
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
J. Matharu, G. Cabailh, G. Thornton,