| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5422514 | Surface Science | 2013 | 6 Pages |
Abstract
⺠A click-chemistry reaction is used to anchor ethynyl-ferrocene on SiO2 layer. ⺠Triazole ring terminated C3 linker has never been tested before on SiO2. ⺠Thin SiO2 layer along with a short alkyl chain linker produces a dielectric barrier. ⺠This hybrid molecular/Si system is promising in memory device applications. ⺠Redox charge/discharge kinetics is studied by means of cyclic voltammetry.
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Authors
V. Aiello, N. Joo, J. Buckley, G. Nonglaton, F. Duclairoir, L. Dubois, J.C. Marchon, M. Gély, N. Chevalier, B. De Salvo,