| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5422603 | Surface Science | 2012 | 6 Pages |
Abstract
⺠Microscopic images of Ti-deposited Si(113) surfaces are presented at the atomic scale. ⺠The anisotropic growth of silicide particles is specific to the Si(113) surface. ⺠The growth mechanism on this surface is different from (001) and (111) surfaces. ⺠Lattice mismatch between TiSi2 and the reconstructed surface structure is crucial. ⺠The findings present usefulness of high-index surfaces for fabrication on silicon.
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Chemistry
Physical and Theoretical Chemistry
Authors
T. Manaka, T. Aoki, K. Shudo,