| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5422641 | Surface Science | 2013 | 5 Pages |
Abstract
⺠CrSi2 films were fabricated by using co-deposition and post-annealing treatment. ⺠The silicide films were characterised by means of XRD and XPS. ⺠Ambiguous shift of the Cr2p3/2 peak of CrSi2 from Cr in the XPS analysis ⺠Compensation of the initial- and final-state effects causes the ambiguity. ⺠The possible silicides were predicted by Pretorius' EHF model.
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Authors
P.L. Tam, Y. Cao, L. Nyborg,