| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5422727 | Surface Science | 2013 | 6 Pages |
Abstract
⺠A subnanometric silicate phase forms at the interface between cerium oxide and Si. ⺠The silicate phase evolves in thickness and composition after thermal treatments. ⺠The interfacial reaction has the same extent on the (111) and (100) Si surfaces. ⺠The interfacial reaction is partially limited by the presence of a silicon oxide. ⺠The silicate phase is stable towards oxidizing treatments.
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
F. Pagliuca, P. Luches, S. Valeri,