| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5423092 | Surface Science | 2012 | 7 Pages |
Abstract
⺠Study of the thermal stability and morphology of epitaxial AlF3 films on Cu(100). ⺠AlF3 decomposes upon low-energy electron irradiation. ⺠Thin films (1-2 ML) rearrange and dewet the substrate upon mild annealing (T < 500 K). ⺠Thicker films are stable up to ca. 760 K.
Related Topics
Physical Sciences and Engineering
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Authors
G. Ruano, J.C. Moreno-López, M.C.G. Jr., R.A. Vidal, J. Ferrón, M.Á. Niño, R. Miranda, J.J. de Miguel,