| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5423122 | Surface Science | 2011 | 9 Pages |
Abstract
⺠Hydrogen termination does not suppress the interfacial reaction between Ni and Si. ⺠Below 33% Ni, a silicide-like layer forms and prevents Ni from oxidation in air. ⺠Ni grows in a pseudo-layer-by-layer mode on the H-Si surface. ⺠A metallic Ni/Ni-rich-silicide-like/NiSi-like structure grows eventually on H-Si.
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Authors
Z. Zhang, J.S. Pan, J.W. Chai, J. Zhang, E.S. Tok,