Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5423283 | Surface Science | 2011 | 5 Pages |
Abstract
⺠STM-TDS combined study of atomic H chemisorption on the Si(111)â 3xâ 3R30â-B surface. ⺠H is reactive on the Si(111)â 3xâ 3R30â-B surface. ⺠H is adsorbed on the surface by destroying the â 3xâ 3 structure.
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Yuki Aoki, Hiroyuki Hirayama,