| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5423322 | Surface Science | 2011 | 10 Pages |
Abstract
⺠Detailed study of metal organic chemical vapor deposition of TiO2 on Si(111). ⺠Surface chemistry of titanium(IV) tetra isopropoxide on Si(111), SiOx and TiO2. ⺠Understanding of the changeover from reaction-limited growth to flux-limited growth. ⺠Importance of the surface stability of carbonaceous compounds. ⺠The transition from an amorphous interface to crystalline anatase TiO2 was monitored.
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Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
P.G. Karlsson, J.H. Richter, M.P. Andersson, M.K.-J. Johansson, J. Blomquist, P. Uvdal, A. Sandell,