Article ID Journal Published Year Pages File Type
5423345 Surface Science 2011 6 Pages PDF
Abstract
► Dynamic Monte Carlo simulation of Co deposition on Cu (001). ► Co penetration of Cu substrate and Cu segregation into Co layers are observed. ► Initial Co island formation is followed by Frank-van der Merwe growth mode. ► Substrate temperature and deposition rate can be adjusted to control the extent of Co/Cu intermixing.
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Related Topics
Physical Sciences and Engineering Chemistry Physical and Theoretical Chemistry
Preview
Dynamic Monte Carlo simulation of film-substrate interface mixing in the deposition of Co on Cu (001)
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