Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5423349 | Surface Science | 2011 | 4 Pages |
Abstract
⺠We confirmed that In atoms favor to congregate inside a hole structure. ⺠We fabricated hole structures by applying voltage during As4 irradiation at 300 °C. ⺠With the In and As4 irradiations, the hole structures congregated In atoms. ⺠Growth rate inside the hole structure was higher than that on the WL region.
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Takashi Toujyou, Shiro Tsukamoto,