Electric field effect on low temperature nanoscale oxidation

The influence of electric fields on the low temperature oxidation of individual nanoscale tungsten wires was investigated. In the experiments at room temperature, the nanowires were biased as anode opposite to a macroscopic cathode and H2O-vapor with a pressure of 10−7-101 mbar was provided as oxygen source. Under the influence of an electric field, a dramatic change of the oxidation behavior is observed with the formation of several 10 nm thick oxide layers for electric fields exceeding a threshold. The chemical composition of the layers formed is determined with laser-assisted atom probe tomography to be slightly understoichiometric WO3. After an initial period of fast growth, the oxidation rate later rapidly decreases to immeasurable low values. Evaluation of the electric field distribution in the vicinity of the sample by the finite element method reveals that oxide formation only proceeds if a critical field in the range of 0.7-5.0 V/nm, depending on the H2O-pressure, is present. This critical field is attributed to a field-activated reaction of H2O at the oxide-vapor interface. Besides for tungsten, field-induced oxidation is also observed for aluminum and p-doped silicon and thus apparently is a widely material independent phenomenon.